年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮(Nitrogen Trifluoride），化学式NF3，是⼀种强氧化剂。作為⼀种重要的⼯业特种⽓式
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热來实现其应⽤。三氟化水还可⽤作⾼能燃料，并且在⽕箭发射中作為氧化剂和推进剂使⽤.

I-Nitrogen trifluoride, i-chemical formula NF3, yi-oxidizing agent eyomeleleyo. Njengegesi ekhethekileyo yoshishino ebalulekileyo, inoluhlu olubanzi lwezicelo.
Kushishino lwe-microelectronics, initrogen trifluoride yeyona gesi igqwesileyo yeplasma etching; Kwi-chip ye-semiconductor, i-flat panel display, i-optical fiber, iiseli ze-photovoltaic kunye nezinye iindawo zokuvelisa, i-nitrogen trifluoride isetyenziswa kakhulu njenge-plasma etching gas kunye ne-reaction cavity yokucoca i-agent.
Inokusetyenziswa kwakhona kwii-laser zekhemikhali zamandla aphezulu ukufezekisa isicelo sayo ngokusabela nge-hydrogen ukukhupha ubushushu obukhulu ngephanyazo. I-Nitrogen trifluoride ikwasetyenziswa njengamafutha ane-eneji ephezulu nanjenge-oxidizer kunye ne-propellant ekuqalisweni kwe-rocket.